MATHEMATICAL MODELING OF CHEMICAL VAPOR DEPOSITION OF MATERIAL ON A CURVILINEAR SURFACE

In this work, a mathematical model has been constructed that describes the process of chemical vapor deposition of material on a curvilinear plate. On the boundary where the deposition occurs, account is taken of convective heat transfer, heat transfer by radiation, and heat and mass transfer during the attachment of the substance to the surface.
A numerical algorithm is proposed for fi nding the temperature profi le at any instant of time; results and an analysis
of numerical calculation are given for different materials.
In this work, a mathematical model has been constructed that describes the process of chemical vapor deposition of material on a curvilinear plate. On the boundary where the deposition occurs, account is taken of convective heat transfer, heat transfer by radiation, and heat and mass transfer during the attachment of the substance to the surface.
A numerical algorithm is proposed for fi nding the temperature profi le at any instant of time; results and an analysis
of numerical calculation are given for different materials.
Author:  G. N. Kuvyrkin, A. V. Zhuravskii, and I. Yu. Savel′eva
Keywords:  chemical vapor deposition, curvilinear surface, numerical modeling
Page:  1374